I-ASML, umholi womhlaba wonke ezinhlelweni ze-semiconductor lithography, isanda kumemezela ukuthuthukiswa kobuchwepheshe obusha be-ultraviolet (EUV) lithography. Lobu buchwepheshe kulindeleke ukuthi buthuthukise kakhulu ukunemba kokukhiqizwa kwe-semiconductor, okuvumela ukukhiqizwa kwama-chip anezici ezincane kanye nokusebenza okuphezulu.
Uhlelo olusha lwe-lithography lwe-EUV lungafinyelela isinqumo esingafika kuma-nanometer angu-1.5, okuwukuthuthuka okukhulu kunesizukulwane samanje samathuluzi e-lithography. Lokhu kunemba okuthuthukisiwe kuzoba nomthelela omkhulu ezintweni zokupakisha ze-semiconductor. Njengoba ama-chips eba mancane futhi eyinkimbinkimbi, isidingo samatheyipu okuthwala anembile kakhulu, amatheyipu okumboza, nama-reels ukuqinisekisa ukuthuthwa nokugcinwa okuphephile kwalezi zingxenye ezincane sizokhula.
Inkampani yethu izibophezele ekulandeleni eduze lezi ntuthuko zobuchwepheshe embonini ye-semiconductor. Sizoqhubeka nokutshala imali ocwaningweni nasekuthuthukisweni ukuze sithuthukise izinto zokupakisha ezingahlangabezana nezidingo ezintsha ezilethwe ubuchwepheshe obusha be-lithography be-ASML, obuhlinzeka ngokusekelwa okuthembekile kwenqubo yokukhiqiza ye-semiconductor.
Isikhathi sokuthunyelwe: Feb-17-2025