I-ASML, umholi womhlaba jikelele kwa-semiconductor lithophres Systems, usanda kumemezela ukuthuthukiswa kwe-extraviest entsha ye-ultraviolet (EUV) ye-Lithography Technology. Lobu buchwepheshe kulindeleke ukuthi bathuthukise kakhulu ukunemba kokukhiqiza i-semiconductor, okwenza ukukhiqizwa kwama-chip ngezinto ezincane nokusebenza okuphezulu.
Uhlelo olusha lwe-EUV Lithophy lungafinyelela isixazululo esifinyelela ku-1.5 nanometers, ukuthuthukiswa okukhulu kwesizukulwane samanje samathuluzi we-lithography. Lokhu kuqonda okuthuthukisiwe kuzoba nomthelela omkhulu ezintweni ezifakwayo ze-semiconductor. Njengoba ama-chips eba mncane futhi eyinkimbinkimbi ngokwengeziwe, isidingo sokuphakama kwamateyipu aphezulu - ukubhala, amateyipu wekhava, nama-reels ukuqinisekisa ukuthutha okuphephile nokugcinwa kwalezi zinto ezincane kuzokhula.
Inkampani yethu izibophezele eduze kokulandela ukuthuthuka kwezobuchwepheshe embonini ye-semiconductor. Sizoqhubeka nokutshala imali ocwaningweni nasekuthuthukisweni ukuze sithuthukise izinto zokupakisha ezingahlangabezana nezidingo ezintsha ezenziwa ngobuchwepheshe be-ASML entsha ye-Lithography, ukuhlinzeka ngokusekelwa okuthembekile kwenqubo yokukhiqiza i-semiconductor.
Isikhathi sePosi: Feb-17-2025